A program to solve a solute diffusion problem with segregation at a moving interface

Title of program: DIFSEG Catalogue Id: ABVZ_v1_0 Nature of problem The diffusion and segregation of impurities implanted in silicon which accompany the annealing of implantation damage by means of pulsed-laser irradiation. Versions of this program held in the CPC repository in Mendeley Data ABVZ_v1_0; DIFSEG; 10.1016/0010-4655(81)90141-7 This program has been imported from the CPC Program Library held at Queen's University Belfast (1969-2018)程序名称：DIFSEG 目录编号：ABVZ_v1_0 问题属性 硅中注入的杂质，在通过脉冲激光辐照退火以修复注入损伤的过程中所发生的扩散与偏析行为。 本程序的各版本存储于Mendeley Data的CPC资料库中，对应条目为：ABVZ_v1_0；DIFSEG；10.1016/0010-4655(81)90141-7 本程序源自贝尔法斯特女王大学维护的CPC程序库（1969-2018年）