Nanostructures fabrication with use of electrical AFM litography

In the last 10 years, one of the nanotechnological trends has been observed, consisting in the development of new variants of computer memory systems with high capacity and speed of access, using quantum dots. One of the techniques for creating nanodots and other nanostructures is based on the use of an atomic force microscope acting as a lithographic device [1]. By means of AFM electric lithography, it is possible to modify both the geometrical properties of the surface and its electrical properties. For example, by applying a voltage through the conductive probe, it is possible to generate electrochemical processes on the surface, thereby converting the conductor material into a dielectric or vice versa. Examples of literature results indicate the possibility of generating nanoparticles with a diameter of 8-10 nm. This corresponds to an information recording density of 0.6 Tbit / inch2. The collection includes 10 images documenting the formation of lithographic structures and 5 current-voltage curves registered in various areas (base and plotted) of the sample surface. Lithographs were made with a CTD-NCHR conductive probe on the surface of the prosthetic CoCrMo alloy, which turned out to be a substrate susceptible to local lithographic oxidation.
[1] L.G. Rosa, J. Liang, Atomic force microscope nanolithography: dip-pen, nanoshaving, nanografting, tapping mode, electrochemical and thermal nanolithography, J. Phys. Condens. Matter. 21 (2009) 483001. doi:10.1088/0953-8984/21/48/483001.