The base material for pattern formation
收藏国家林业和草原科学数据中心2023-02-12 更新2024-03-07 收录
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SUBJECT of the Invention This invention makes it a subject for the patterning property to provide the favorable base material for pattern formation. PROBLEM to be solved This invention is a base material for pattern formation with which a fiber width contains the base layer containing fibriform cellulose 1000 nm or less and a resin layer， Comprising: Content of the low molecular weight compound whose molecular weight in a base layer is 400 or less is related with the base material for pattern formation which is less than 20 mass % with respect to the total mass of a base layer. SELECTED DRAWINGS FIG. 1 [MAT_IMAGE 000002]
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国家林业和草原科学数据中心
创建时间：
2023-02-12
