XPS of boron doped carbon nanowalls with different doping level
收藏DataCite Commons2026-03-02 更新2026-05-04 收录
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资源简介：
XPS analysis was performed with Escalab 250Xi (ThermoFisher Scientific, United Kingdom) equipped with a monochromatic Al X-ray source. High-resolution spectra were made at a pass energy of 10 eV and energy step size of 0.1 eV. The size of X-ray spot was 250 µm. BCNW samples were synthesized using MWPECVD technology (SEKI Technotron AX5400S, Japan) with chamber base pressure at 10−4 Torr. Two boron-doped samples were prepared under controlled gas phase conditions with total flow rate of 328 sccm, process pressure of 50 Torr, microwave power of 1300 W at 2.45 GHz frequency, and growth duration calibrated to achieve uniform film thickness of ≈3.2 µm.
提供机构：
Gdańsk University of Technology
创建时间：
2026-02-27
