Etching of Nitrides-NbN Heterostructures
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https://zenodo.org/record/7225799
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资源简介：
Niobium Nitride (NbN) is metallic at room temperature. NbN / III-N heterostructures are of interest for
new devices applications such as the Metal Base Transistor (MBT). Niobium Nitride etching in fluorine plasma is documented by Reactive Ion Etching (RIE). In this document we present the etching of a III-Nitride NbN heterostructure with fluorine
chemistry Inductively Coupled Plasma (ICP).
创建时间：
2024-07-15
