EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY
收藏国家林业和草原科学数据中心2023-02-12 更新2024-03-07 收录
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资源简介：
A device located between the energy source and the imprint lithography can block the exposure of energy to portions of the polymeric material distributed over the substrate. Portions of the polymerizable material that are shielded from energy remain fluid while the remaining polymerizable material solidifies. Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid， while the remaining polymerizable material is solidified. Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid， while the remaining polymerizable material is solidified.
提供机构：
国家林业和草原科学数据中心
创建时间：
2023-02-12
