Response Source Data for "Nano-seeding catalysts for high-density arrays of horizontally aligned carbon nanotubes with wafer-scale uniformity"

Source data accompanying the authors’ response concerning the article “Nano-seeding catalysts for high-density arrays of horizontally aligned carbon nanotubes with wafer-scale uniformity”, Nature Communications 16, 149 (2025), DOI: 10.1038/s41467-024-55515-0. Response Source Data.zip contains five Excel workbooks covering:• Fig. 2a: ion implantation depth profiles, including raw and processed signals before and after annealing.• Fig. 4d: electrical test settings and measurement records.• Fig. 4f: output characteristics.• Fig. 4g: transfer characteristics of 80 field-effect transistors.• Supplementary Fig. 4: SRIM depth profiles, with depths in ångströms and the corresponding conversion to nanometres. The ZIP archive is provided as supplied, with the original workbook filenames and contents. Related discussion: https://pubpeer.com/publications/D6F4C15EFAC5833F362F25813B7BA3