EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY
收藏国家林业和草原科学数据中心2023-02-12 更新2024-03-07 收录
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A device positioned between the energy source and the imprint lithography can block exposure of energy to portions of the polymeric material dispensed over the substrate. The portions of the polymeric material that are blocked from energy remain fluid while the remaining polymeric material solidifies. Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid， while the remaining polymerizable material is solidified. Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid， while the remaining polymerizable material is solidified.
提供机构：
国家林业和草原科学数据中心
创建时间：
2023-02-12
