铌酸锂薄膜表面粗糙度第三方测试原始数据

硅基铌酸锂薄膜异质集成材料是发展硅基芯片上混合集成高性能线性电光调制器的重要材料基础，铌酸锂薄膜的表面粗糙度对光子器件以及调制器的性能起做决定性的作用。本课题采取化学机械抛光技术，改善离子注入剥离铌酸锂薄膜后的表面粗造度，通过系统的工艺开发，课题实现了低至0.3 nm的铌酸锂薄膜表面粗糙度，为高性能光子学器件奠定基础。本数据集包括硅基铌酸锂异质集成薄膜材料的表面粗糙度数据，以及第三方测试报告。Silicon-based lithium niobate thin film heterogeneous integration materials serve as a critical material foundation for developing high-performance hybrid integrated linear electro-optic modulators on silicon-based chips. The surface roughness of lithium niobate thin films plays a decisive role in the performance of photonic devices and modulators. This study adopted chemical mechanical polishing (CMP) technology to improve the surface roughness of lithium niobate thin films after ion implantation and lift-off. Through systematic process development, the study achieved a surface roughness of lithium niobate thin films as low as 0.3 nm, laying a foundation for high-performance photonic devices. This dataset includes surface roughness data of silicon-based lithium niobate heterogeneous integration thin film materials, as well as third-party test reports.

搜集汇总

背景与挑战

背景概述

该数据集包含硅基铌酸锂异质集成薄膜材料的表面粗糙度数据及第三方测试报告，数据量为11.54MB，文件数为3个。通过化学机械抛光技术，实现了低至0.3 nm的表面粗糙度，为高性能光子学器件提供了重要基础。