Critical Dimension Small angle x-ray scattering: Autonomous experimentation and application to the characterization of overlay and line roug

Critical-Dimension Small angle X-ray scattering (CD-SAXS) is nowadays a reference technique to accompany the component size reduction produced by the semiconductor industry over the year. This is mainly driven by promising results combined with the potential high resolution of the technique and the constantly search for new metrologies capable of a non-destructive evaluation of three-dimensional (3D) nanoscale patterns. In the frame of this proposal we are targeting two different goals:
1- Detect and understand the signal coming from line-edge roughness on samples specially designed to confirm our simulations.
2- Develop the methodology and parameter uncertainty to unable autonomous CD-SAXS measurements.