Investigation of plasmon resonance in a silver nanoparticles

Silver nanostructures were prepared on borosilicate glass (Corning 1737F) substrates. Thin Ag films (1–9 nm thickness) were deposited using a table-top dc magnetron sputtering coater (EM SCD 500, Leica) in pure Ar plasma (argon, Air Products 99.999%). The Ag target was of 99.99% purity, the rate of layer deposition was about 0.4 nm·s−1, and the incident power was in the range of 30–40 W. The layer thickness was measured in situ using a quartz crystal microbalance. To form nanostructures, the as-prepared films were put into a hot furnace and annealed in argon atmosphere at different temperatures for different periods of time. Plasmon resonance was observed in a UV-VIS (Thermo Fisher Scientific Evolution 220 spectrophotometer in transmission mode, in a range of 200–1100 nm) spectroscopy results, as a absorption peak on transmission spectra.本研究以硼硅酸盐玻璃（Corning 1737F）为衬底制备银纳米结构。采用直流磁控溅射台式镀膜机（EM SCD 500，徕卡）于纯氩等离子体（氩气，Air Products 99.999%）中沉积厚度为1~9 nm的银薄膜。所用银靶材纯度为99.99%，薄膜沉积速率约为0.4 nm·s⁻¹，入射功率范围为30~40 W。通过石英晶体微天平对薄膜厚度进行原位监测。为获得银纳米结构，将初始制备的薄膜置于高温炉中，在氩气气氛下以不同温度、保温不同时长进行退火处理。通过紫外-可见光（UV-VIS）光谱测试——采用赛默飞世尔科技Evolution 220分光光度计，运行透射模式，测试波段覆盖200~1100 nm——在透射光谱中观察到了等离子体共振吸收峰。