Titanium dioxide (TiO2) thin films study, deposited by laser ablation on glass substrates in the form of prismatic figures type pyramidal

Thin films are something that is very close to the atomic dimensions in thickness, therefore if it is possible to further reduce the width of these, in a controlled way and monitor the behavior of some physical law associated with the variation in thickness, the results can be as expected or maybe adjustments must be applied. For this reason in this work, thin films of titanium dioxide (TiO2) are studied, deposited by laser ablation, on glass substrates in the form of prismatic figures. The main objective was to confine the plasma plume to produce a continuous trail with varying thicknesses that could be analyzed. Growth times of the films were 5, 10, 15, 20 and 30 minutes at room temperature in a low vacuum. The deposited films presented a color pattern related to the expected thickness variation, thus the theory of optical interference was applied to the continuous trace to calculate thicknesses. Characterization process was carried out by: X-ray diffraction to know the crystalline structure of the films, ultraviolet-visible spectroscopy to verify the variation of thicknesses, X-ray photoelectron spectroscopy to know the composition and scanning electron microscopy, to measure the thicknesses of the films transversely.薄膜的厚度极接近原子尺度，因此若能以可控方式进一步缩减其宽度，并监测与厚度变化相关的物理规律演化，则可获得预期结果，或需针对性调整方案。基于此，本研究以激光烧蚀法在玻璃衬底上制备了呈棱柱状形貌的二氧化钛（TiO₂）薄膜，并以此展开研究。本研究的核心目标为约束等离子体羽流，以生成厚度可变且可开展表征分析的连续薄膜轨迹。实验在低真空、室温环境下进行，薄膜沉积时长分别设置为5、10、15、20及30分钟。沉积得到的薄膜呈现出与预期厚度变化相匹配的色彩图案，因此本研究借助光学干涉理论对该连续薄膜轨迹进行分析，以计算其厚度。薄膜的表征流程采用如下手段：通过X射线衍射（X-ray diffraction）分析薄膜的晶体结构；利用紫外-可见分光光谱（ultraviolet-visible spectroscopy）验证厚度变化；借助X射线光电子能谱（X-ray photoelectron spectroscopy）表征薄膜成分；并通过扫描电子显微镜（scanning electron microscopy）横向测量薄膜厚度。