Tailoring Ti Grade 2 and TNTZ alloy surfaces in a two-step mechanical-chemical modification

This record contains all files generated in the preparation process of the following publication: Agnieszka Kowalczyk, Donata Kuczyńska-Zemła, Agata Sotniczuk, Klaudia Anuszewska and Halina Garbacz,<br> "Tailoring Ti Grade 2 and TNTZ alloy surfaces in a two-step mechanical-chemical modification", submitted to Surface Engineering. <br> Designations:<br> Ti alloy - Ti-29Nb-13Ta-4,6Zr alloy (TNTZ)<br> G - sample grinded on #600 grit abrasive paper<br> S_1,2 - sample shot peened with 90-150 µm shots, under pressure of 0.2 MPa<br> S_1,3 - sample shot peened with 90-150 µm shots, under pressure of 0.3 MPa<br> S_1,4 - sample shot peened with 90-150 µm shots, under pressure of 0.4 MPa<br> S_1,5 - sample shot peened with 90-150 µm shots, under pressure of 0.5 MPa<br> S_2,4 - sample shot peened with 150-250 µm shots, under pressure of 0.4 MPa<br> S_2,5 - sample shot peened with 150-250 µm shots, under pressure of 0.5 MPa<br> SE_1,2 - sample shot peened with 90-150 µm shots, under pressure of 0.2 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> SE_1,3 - sample shot peened with 90-150 µm shots, under pressure of 0.3 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> SE_1,4 - sample shot peened with 90-150 µm shots, under pressure of 0.4 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> SE_1,5 - sample shot peened with 90-150 µm shots, under pressure of 0.5 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> SE_2,4 - sample shot peened with 150-250 µm shots, under pressure of 0.4 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> SE_2,5 - sample shot peened with 150-250 µm shots, under pressure of 0.5 MPa and etched in a solution of 3% hydrofluoric acid (HF)<br> HV - Vickers hardness<br> SEM - Scanning Electron Microscopy<br> R - roughness<br> W - wettability <br> Folders content:<br> Hardness - contains files with data obtained from hardness tests using a Falcon 500 hardness tester with a Vickers indenter at a load of 1.96 N (HV0.2)<br> Roughness - contains files from topography analysis obtained using a Wyko NT9300 optical profilometer for various scan areas<br> SEM - contains images of samples surfaces from Hitachi SU8000 and Hitachi SU70 Scanning Electron Microscopes <br> Wettability - contains files with data obtained from wettability tests using a DataPhysics OCA 25 goniometer with the sessile drop method This research was funded in part by National Science Centre, Poland [Grant no. 2022/45/B/ST5/03398].