XRD and electrochemical results for MoO3 films deposited using pulsed laser deposition system
收藏Mendeley Data2024-01-31 更新2024-06-28 收录
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The attached data contains XRD and electrochemical results for MoO3 films deposited on fluorine-doped tin oxide glasses. Films were deposited using a pulsed laser deposition system at different conditions. Part of the samples was deposited at room temperature and then annealed at 575°C for given times (samples labeled PLD_RT_575C_xmin, where x stands for annealing time). Other samples were deposited at 450°C (PLD_450C) in different gas atmospheres. Electrochemical measurements were performed in 1 M AlCl3 aqueous solution with a 2.5 mV/s scan rate.
创建时间：
2024-01-31
