Ultra-thin film of aluminum oxide influence on the plasmon resonance in gold nanostructures

Ultra-thin film of aluminum oxide influence on the plasmon resonance in gold nanostructures was measured by UV-VIS spectroscopy. Ultra thin film of Al2O3 was deposited on a gold nanostructures. Thickness of film was 2nm - 8nm. Shift of plasmon resonance was observed, as a result of various dielectric constant of layer.

本研究采用紫外-可见分光光度法（UV-VIS spectroscopy），测定了氧化铝超薄膜对金纳米结构表面等离子体共振（plasmon resonance）的影响。实验过程中，研究者将三氧化二铝（Al₂O₃）超薄膜沉积于金纳米结构表面，薄膜厚度范围为2nm至8nm。由于该介质层具备不同的介电常数，实验中观测到了等离子体共振峰的位移。