20nm衍射成像分辨率的实现

使用分辨率靶作为样品，放置在TXM系统的样品处，通过观察星条靶靶线来测试系统的空间分辨。分辨率测试卡为Zeiss公司，型号X30-30-2，最小尺寸为30nm。将单色器能量设置为8keV，样品处放置X射线分辨率测试卡，调节TXM成像系统中各元件的距离及姿态，对分辨率靶进行成像，将成像结果利用功率谱进行分析（Power Spectrum Density，PSD），得到成像空间分辨率。

A star bar resolution target was used as the sample and placed on the sample stage of the TXM system. The spatial resolution of the system was tested by observing the bar lines of the star target. The resolution test target is manufactured by Zeiss, with the model number X30-30-2, and its minimum feature size is 30 nm. The energy of the monochromator was set to 8 keV. The distances and orientations of all components in the TXM imaging system were adjusted to image the resolution target. The acquired imaging results were analyzed using Power Spectrum Density (PSD), and the spatial resolution of the imaging system was finally obtained.

搜集汇总

背景与挑战

背景概述

该数据集聚焦于实现20纳米级别的衍射成像空间分辨率，通过同步辐射TXM系统对Zeiss分辨率靶进行实验，利用功率谱分析（PSD）方法评估成像性能。数据来源于国家重点研发计划项目，包含4个文件共4.53MB，适用于物理学和工程技术的相关研究，展示了高精度X射线成像技术的应用。