Effect of annealing on ion-beam-sputtered hafnium oxide thin films properties
收藏科学数据银行2024-12-30 更新2026-04-23 收录
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https://www.scidb.cn/detail?dataSetId=b601d49641e54d81b6943e308d9caa04
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资源简介：
This dataset contains information on HfO₂ thin films, which are known for their high laser damage threshold and low absorption properties. The HfO₂ thin films were prepared using dual ion beam sputtering and annealed in the atmosphere at temperatures ranging from 200 to 700°C. The dataset includes systematic characterization of the optical properties, microstructure, film stress, and absorption loss of the HfO₂ thin films at various annealing temperatures.
提供机构：
Shanghai Institute of Optics and Fine Mechanics
创建时间：
2024-12-24
