Effect of annealing on ion-beam-sputtered hafnium oxide thin films properties

This dataset contains information on HfO₂ thin films, which are known for their high laser damage threshold and low absorption properties. The HfO₂ thin films were prepared using dual ion beam sputtering and annealed in the atmosphere at temperatures ranging from 200 to 700°C. The dataset includes systematic characterization of the optical properties, microstructure, film stress, and absorption loss of the HfO₂ thin films at various annealing temperatures.