Dataset for Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition

The dataset is a basis for a publication of Robust surface functionalization of PDMS through atmospheric pressure atomic layer deposition, intended to be of chapter 3 in the corresponding dissertation. In this dataset, the research objective "Evaluating the use of atmospheric pressure atomic layer deposition (AP-ALD) in functionalizing the surface of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.) and origin file containing the XPS and barrier property data (opju).

本数据集为《通过常压原子层沉积实现聚二甲基硅氧烷（PDMS）稳健表面功能化》的研究成果提供核心支撑，同时将作为对应学位论文的第3章内容。本数据集围绕的研究目标为：评估常压原子层沉积（atmospheric pressure atomic layer deposition, AP-ALD）应用于平整聚二甲基硅氧烷基底表面功能化改性的效果。本次数据采集采用了多种表征技术，涵盖先进显微表征、先进光谱表征以及新开发的阻隔性能测试方法。本次公开的数据包含两类形式：一类为JPEG格式图像，另一类为包含X射线光电子能谱（X-ray Photoelectron Spectroscopy, XPS）与阻隔性能数据的.opju格式源文件。