Data and Code for Atomic Scale Etching of Diamond: Insights from Molecular Dynamics Simulations
收藏DataCite Commons2024-10-07 更新2025-04-09 收录
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https://datacommons.princeton.edu/discovery/doi/10.34770/xb7d-6h47
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资源简介：
This work investigates the effects of argon ions, hydrogen atoms, and
hydrogen ions on the diamond (100) surface using classical molecular
dynamics simulations. The purpose of this investigation was to asses
plasma processing techniques for applications in quantum device
manufacturing. The simulations suggest that combining argon ion smoothing
with selective, near threshold energy H removal of amorphous C could be an
effective strategy for diamond surface engineering, leading to more
reliable and sensitive diamond color center devices. Results were found to
differ significantly with interatomic potential, and an analysis of these
differences was also carried out. Included in this repository are LAMMPS
source files, input scripts, and plotting scripts required to reproduce
the data. Also included are the output data required to make all the plots
included in the associated publication.
提供机构：
Princeton Plasma Physics Laboratory, Princeton University
创建时间：
2024-04-08
