Data underlying the publication Application of a dual-thermopile radical probe to high-flux expanding hydrogen plasmas

Publication information:<br>Title: Application of a dual-thermopile radical probe to high-flux expanding hydrogen plasmas<br>Authors: Shih-Chi Wang, Maarten van Kampen, and Thomas W. Morgan<br>Corresponding author: Shih-Chi Wang<br>Corresponding ORCID: 0000-0002-1892-5285<br>Corresponding email address: [e-mail]<br>Organizations: DIFFER - Dutch Institute for Fundamental Energy Research and ASML<br>Journal: Plasma Sources Science and Technology<br>Keywords: cascaded arc source, heat flux sensor, hydrogen plasma, plasma-material processing, radical probe<br>Resource title: To be determined<br>Resource DOI: To be determined<br><br>Description: This publication concerns experimental work on plasma diagnostics, and the research objective is to measure hydrogen radical flux using a dual-thermopile radical probe. The data collection was carried out by a Keithley 2410 SourceMeter and a GraphTec midi logger GL200A connected to a PC. The collected data is series of numbers and is plotted in the multiple figures of the publication. This replication package contains multiple folders, each of which corresponds to a figure in the publication.<br><br>Creation date: 07-Sep-2021<br><br>Access right: open access<br><br>File formats: text file (.txt), common separated data file (.csv), excel sheet (.xlsx), portable network graphics (.png), and python script (.py).<br><br>Software version: Anaconda3-2019.10<br><br>Hardware version: Intel(R) Core(TM) i7-8650U CPU, RAM 8.0 GB<br><br>