Data for: Characteristics of TiO2 Thin Films Surfaces Treated by O2 Plasma in Dielectric Barrier Discharge with the Assistance of External Heating

Fig. 2. MB dye photodecomposition, ln(C/C0), of (a) TiO2 thin films treated with the heat-assisted plasma and the plasma only, and (b) TiO2 thin films annealed at a variety of gas pressures, as a function of UV irradiation time. Fig. 3. XRD patterns of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. Fig. 4. Optical absorption coefficients of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. Energy spectrum of photons emitted from a blacklight lamp used is also drawn in the same figure. Fig. 5. (a) O/Ti ratios for oxygen species adsorbed onto the surfaces of TiO2 thin films treated with the heat-assisted plasma and the plasma only at a gas pressure of 100 kPa. (b) O/Ti ratios for the O–Ti bond of the plasma-treated surfaces. Fig. 6. XRD patterns of TiO2 thin films annealed at a variety of gas pressures. Fig. 7. O/Ti ratios for oxygen species adsorbed onto the surface of TiO2 thin films annealed at a variety of gas pressures. Fig. 8. Comparison between MB dye photodecomposition rates, MB dye adsorption rates, and net MB dye photodecomposition rates of TiO2 thin film treated with the heat-assisted plasma and TiO2 nanoparticle powder, ST-01.

图2 亚甲基蓝（MB）染料光降解的ln(C/C0)值随紫外辐照时长的变化：(a) 经热辅助等离子体与纯等离子体处理的二氧化钛（TiO2）薄膜，(b) 在不同气体压力下退火的二氧化钛（TiO2）薄膜。图3 气体压力为100 kPa时，经热辅助等离子体与纯等离子体处理的二氧化钛（TiO2）薄膜的X射线衍射（XRD）图谱。图4 气体压力为100 kPa时，经热辅助等离子体与纯等离子体处理的二氧化钛（TiO2）薄膜的光吸收系数；同时在同一图中附上了所用黑光灯发射光子的能谱。图5 (a) 气体压力为100 kPa时，经热辅助等离子体与纯等离子体处理的二氧化钛（TiO2）薄膜表面吸附氧物种的氧钛（O/Ti）比；(b) 等离子体处理表面的O–Ti键的氧钛比。图6 在不同气体压力下退火的二氧化钛（TiO2）薄膜的X射线衍射（XRD）图谱。图7 在不同气体压力下退火的二氧化钛（TiO2）薄膜表面吸附氧物种的氧钛比。图8 经热辅助等离子体处理的二氧化钛（TiO2）薄膜与二氧化钛纳米颗粒粉末ST-01的亚甲基蓝染料光降解速率、亚甲基蓝染料吸附速率及净亚甲基蓝染料光降解速率的对比。