SEM inwestigation of the silver nanostructures

Silver thin films with a thickness of 1nm, 3nm, 5nm, 7nm and 9nm were deposited by a table-top magnetron sputtering unit in a pure argon plasma from a high-purity silver target. Silicon wafers was used as a substrates. As-deposired films were annealed in Ar atmosphere at 550 Celsius degree for 15 minutes.As a result of annealing, Ag nanostructures formed on silicon. Morphology of obtained nanostructures was measured by SEM technique (FEI Quanta microscope).

本研究采用台式磁控溅射装置，以高纯度银靶为溅射源，在纯氩等离子体环境中沉积了厚度分别为1nm、3nm、5nm、7nm和9nm的银薄膜。实验以硅片作为沉积衬底。将沉积态薄膜置于氩气氛围中，于550摄氏度下退火15分钟。退火后，硅衬底表面形成了银纳米结构。采用扫描电子显微镜（Scanning Electron Microscope，SEM）技术，借助FEI Quanta型显微镜对所得纳米结构的形貌进行了表征。