NIST Nanocalorimeter DWG and DXF drawings for microfabrication mask generation

Four files are included in this data set for mask generation that can be used to produce photolithography contact masks to create NIST nanocalorimeters. Two different designs are included, each in AutoCAD *.dwg format and a universal *.dxf format. The masks are intended to be printed on 5 inch masks blanks used to pattern 100 mm (4 inch) wafers. The front drawings are used to pattern the metal layer that defines the contact pads and the combined heater / thermometer and includes alignment marks at the center of the mask and at approximately plus and minus 1 inch along the X-axis for front to back alignment. The rear drawings have already been mirrored and define the KOH etch windows used to create individual die and create the windows in the center of the nanocalorimeter. The dimensions of the windows was defined for a standard, nominal, 525 micron thick 100-mm wafer.Please cite the related paper "Guide to the Design, Fabrication and Calibration of NIST Nanocalorimeters" by Feng Yi, Michael D. Grapes, and David A. LaVan in the Journal of Research of the National Institute of Standards and Technology, Volume 124 (in press).

本数据集包含4个用于掩模生成的文件，可用于制备美国国家标准与技术研究院（National Institute of Standards and Technology, NIST）纳米量热计所需的光刻接触掩模。数据集包含两种不同的设计方案，分别存储为AutoCAD *.dwg格式与通用*.dxf格式。该掩模适配用于对100毫米（4英寸）晶圆进行图案化加工的5英寸空白掩模基板。正面图纸用于图案化金属层，该金属层用于定义接触焊盘与组合式加热器/温度计；同时正面图纸还在掩模中心以及沿X轴正负约1英寸处设置了对准标记，用于实现前后对准。背面图纸已完成镜像处理，用于定义KOH刻蚀窗口，该窗口用于制备独立裸片并在纳米量热计中心开设窗口。窗口尺寸针对标准标称厚度为525微米的100毫米晶圆进行了设定。请引用相关研究论文：发表于《美国国家标准与技术研究院研究期刊（Journal of Research of the National Institute of Standards and Technology）》第124卷（待刊）的"Guide to the Design, Fabrication and Calibration of NIST Nanocalorimeters"，作者为Feng Yi、Michael D. Grapes与David A. LaVan。