five

Supplementary Material for "Low Temperature Behaviour of Ti/Al/Ti/Au Contacts to AlGaN/GaN Heterostructures"

收藏
DataCite Commons2025-03-26 更新2024-08-25 收录
下载链接:
https://www.repository.cam.ac.uk/handle/1810/365355
下载链接
链接失效反馈
官方服务:
资源简介:
This supplementary material contains fits of Frenkel-Poole emission and trap-assisted tunnelling to the current-voltage characteristics of Ti/Al/Ti/Au contacts to AlGaN/GaN heterostructures, annealed at 700 °C for 30 s. The raw data for these fits will be provided in a later upload, alongside all other raw data for the paper this supports. Also given are transmission electron microscopy images of the AlGaN barrier in AlGaN/GaN heterostructures following annealing at different temperatures.
提供机构:
Apollo - University of Cambridge Repository
创建时间:
2024-03-05
二维码
社区交流群
二维码
科研交流群
商业服务