Photocrosslinking enabled direct patterning of colloidal quantum dots and device applications

Colloidal quantum dots (QDs) have demonstrated unique advantages in thin-film optoelectronic devices such as QD light-emitting diodes (QLEDs), owing to their excellent photoelectric properties and solution processability. The development of high-resolution, high-fidelity, and high-performance patterning methods is urgently required for the fabrication of integrated QD-based optoelectronic devices. This review focuses on recent progress made by our research group and others in the direct photolithographic patterning of QDs via photochemical crosslinking chemistry. We discuss how the design of photochemical crosslinking strategies influences the optoelectronic properties of patterned QD films and their application in constructing high-performance QLED devices. We expect that this perspective, centered on photochemical crosslinking chemistry, can provide insights for the development of new patterning strategies and applications of QDs.