Data for: Effect of High Energy Shot Peening on the Wear Resistance of TiN Films on a TA2 Surface

The single magnetron sputtering technology has great limitations in the further optimization of the mechanical properties of TiN films. High energy shot peening (HESP), as a simple and efficient surface nanotechnology, has been widely used in the aerospace, mechanical processing and other fields. After being impacted by the projectile, the surface of the substrate will undergo severe deformation that induces nanocrystallization of the surface grains, thus greatly enhancing the surface activity. Combining HESP with high power impulse magnetron sputtering (HIPIMS)to understand how HESP affects the growth of TiN films on a TA2 surface and whether it can improve the wear resistance of TiN films has important research significance.

单磁控溅射技术在氮化钛（TiN）薄膜力学性能的进一步优化中存在较大局限性。高能喷丸（High Energy Shot Peening, HESP）作为一种简便高效的表面纳米技术，已被广泛应用于航空航天、机械加工等领域。基体表面受弹丸冲击后会发生剧烈变形，诱导表面晶粒产生纳米晶化，从而大幅提升表面活性。将高能喷丸与高功率脉冲磁控溅射（High Power Impulse Magnetron Sputtering, HIPIMS）相结合，探究HESP如何影响TA2基体表面TiN薄膜的生长，以及其能否提升TiN薄膜的耐磨性能，具有重要的研究意义。