XRD patterns of vanadium oxide nanostructures on silicon substrate obtained by V2O5 recrystallization

The DataSet contains the XRD patterns of vanadium oxide nanostructures on silicon substrates obtained by recrystallization of V2O5 thin films between 800-1200°C under synthetic air.  The thin films were obtained by the sol-gel method.  The information about sol synthesis is described in the Journal of Nanomaterials. 
X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.

本数据集包含硅基底上钒氧化物纳米结构的X射线衍射（XRD）图谱，该类结构通过在合成空气氛围下、于800~1200℃温度区间内对五氧化二钒（V₂O₅）薄膜进行重结晶制备得到。上述薄膜采用溶胶-凝胶法制备，有关溶胶合成的详细信息已发表于《Journal of Nanomaterials》。

X射线衍射图谱的采集使用飞利浦X’PERT PLUS型衍射仪，辐射源为Cu Kα射线（波长1.5406 Å），扫描范围为10°至80°。