Dataset for Atmospheric pressure atomic layer deposition for in-channel surface modification of PDMS microfluidic chips

The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 4 in the corresponding dissertation. In this dataset, the research objective "Developing a method for the use of atmospheric pressure atomic layer deposition (AP-ALD) for in-situ coating of polydimethylsiloxane (PDMS) microfluidic chips" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and confocal microscopy). The data also contain 3 case studies (cell study, PVA-PLA study, and photocatalytic study). The presented data were in the form of images (jpg.), origin file containing the case study and characterization (opju), table (xls) and confocal scan images (czi).

本数据集为一篇关于采用大气压原子层沉积（Atmospheric Pressure Atomic Layer Deposition, AP-ALD）提升聚二甲基硅氧烷（Polydimethylsiloxane, PDMS）耐有机溶剂性能的学术研究提供支撑，同时拟作为对应学位论文的第4章内容。本数据集围绕如下研究目标开展工作：开发一套利用大气压原子层沉积（AP-ALD）对聚二甲基硅氧烷（PDMS）微流控芯片进行原位涂层的方法。本次数据采集采用多种表征技术完成，涵盖先进显微成像技术、先进光谱技术与共聚焦显微镜技术。此外，数据集还包含三项案例研究：细胞研究、PVA-PLA研究以及光催化研究。本次公开的数据包含以下格式：图像文件（.jpg）、包含案例研究与表征数据的原始文件（.opju）、表格文件（.xls）以及共聚焦扫描图像文件（.czi）。