Deposition yield and enhancing factor

The enhancement factor Y based on mean power obtained as the ratio between deposition rate of pulse and DC power delivery. The error bars represent the standard deviation offor the 5 different pressure conditions. The deposition yield, i.e., the mass of produced nanoparticles per unit of energy (µg/Wh) for varied pressure and power, delivered by either DC or pulsed sputtering.基于平均功率计算得到的增强因子Y，为脉冲沉积速率与直流功率输出的比值。误差棒代表5种不同压力条件下的标准偏差。沉积产率，即不同压力与功率条件下单位能量所生成的纳米颗粒质量（单位：µg/Wh），由直流溅射或脉冲溅射得到。