Data for: OPTICAL AND ELECTRICAL PROPERTIES OF Ti SUBOXIDES GROWN BY REACTIVE GRID-ASSISTED MAGNETRON SPUTTERING

Data of X-Ray diffraction (XRD), X-Ray photoelectron spectroscopy (XPS) and spectrofotmetry of TiOx films deposited onto glass substrates by magnetron sputtering at different O2 concentrations on working gas flow rate.

本数据集涵盖采用磁控溅射（Magnetron Sputtering）法，在不同氧浓度与工作气体流速条件下沉积于玻璃衬底上的钛氧化物（TiOx）薄膜的X射线衍射（X-Ray Diffraction，XRD）、X射线光电子能谱（X-Ray Photoelectron Spectroscopy，XPS）以及分光光度法测试数据。