Dataset for publication "Effects of Y and Ho doping on microstructure evolution during oxidation of extraordinary stable Hf-B-Si-Y/Ho-C-N films up to 1500 °C" in Materials & Design 237, (2024), 112589.

Dataset for publication "Effects of Y and Ho doping on microstructure evolution during oxidation of extraordinary stable Hf-B-Si-Y/Ho-C-N films up to 1500 °C" in Materials & Design Volume 237, January 2024, 112589, DOI 10.1016/j.matdes.2023.112589. XRD patterns, SAED patterns, EDS spectra, TEM images, HRTEM images.本数据集对应发表于《材料与设计（Materials & Design）》2024年1月第237卷、文章编号112589、DOI为10.1016/j.matdes.2023.112589的论文《钇（Y）与钬（Ho）掺杂对极端稳定Hf-B-Si-Y/Ho-C-N薄膜在最高1500℃氧化过程中微观结构演变的影响》。 该数据集包含X射线衍射（XRD）图谱、选择区域电子衍射（Selected Area Electron Diffraction，SAED）花样、能量色散X射线能谱（EDS）谱图、透射电子显微镜（Transmission Electron Microscopy，TEM）图像以及高分辨透射电子显微镜（High-Resolution Transmission Electron Microscopy，HRTEM）图像。