Structure evolution of V2O5 thin films deposited on quartz glass substrate - High-Temperature X-ray Diffraction

The DataSet contains the XRD patterns of V2O5 thin films deposited on guartz glass. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. The sol was deposited on the quartz glass substrate. The structure was measured in-situ during heating between 50-800°C under synthetic air. X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.

本数据集包含沉积于石英玻璃衬底上的五氧化二钒（V₂O₅）薄膜的X射线衍射（XRD）图谱。该薄膜通过溶胶-凝胶法制备，其溶胶合成的相关信息已在《纳米材料期刊》中进行阐述。具体实验流程为：将溶胶沉积于石英玻璃衬底之上，随后在合成空气氛围下，于50℃至800℃的加热过程中对样品结构开展原位测试。X射线衍射图谱采用飞利浦X’PERT PLUS型衍射仪采集，辐射源为铜Kα辐射（波长1.5406 Å），扫描角度范围为10°至80°。