Chemical investigations of the MoO3 doped by K films deposited FTO

MoO3 thin films were synthesized via thermal annealing of thin, metallic Mo films deposited onto the FTO substrate using a magnetron sputtering system. The influence of photointercalation of alkali metal cation (K+) into the MoO3 structure on the photoelectrochemical properties of the molybdenum trioxide films was investigated. The chemical characterisation of materials was performed by XPS method. Especially Mo and K elemenets were studied on the basis of the high-resolution XPS spectra.

本研究以磁控溅射系统在氟掺杂氧化锡（Fluorine-doped Tin Oxide, FTO）基底上沉积的金属钼薄膜为前驱体，通过热退火工艺合成三氧化钼（MoO₃）薄膜。本研究探究了碱金属阳离子（K⁺）光嵌入三氧化钼结构对该薄膜光电化学性能的影响。采用X射线光电子能谱（X-ray Photoelectron Spectroscopy, XPS）对材料进行化学表征，特别针对钼与钾元素，基于高分辨X射线光电子能谱展开分析。