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Research Data for "Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO4 and Mo doped BiVO4"

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NIAID Data Ecosystem2026-05-02 收录
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https://zenodo.org/record/13788814
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资源简介:
This dataset supports the Figures and Tables for the publication "Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO4 and Mo doped BiVO4" published in Advanced Powder Materials under https://doi.org/10.1016/j.apmate.2024.100234

本数据集为发表于《先进粉末材料(Advanced Powder Materials)》、DOI为https://doi.org/10.1016/j.apmate.2024.100234 的论文《界面空穴积累对BiVO4及Mo掺杂BiVO4光电化学水氧化的促进作用》中的所有图表提供数据支撑。
创建时间:
2024-09-25
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