On-Chip Nanofabrication Techniques for the Manufacturing of Nanoscale Objects Using Nanometal Templating, Shape-Directing Ligands, Atomic Layer Deposition, and Selective Etching

The work presented here focuses on the advancement of substrate-based nanofabrication techniques that are robust, scalable, and yield nanostructures that are not readily obtained using existing techniques. The nanofabrication techniques presented rely on (i) gold nanoparticle arrays that function as templates for fabricating more complex nanostructures, (ii) growth-shaping ligands that define the geometries present after a liquid-based synthesis, (iii) atomic layer deposition for the uniform and atomically thin deposition of metal-oxides, and/or (iv) etching (both wet and dry) to selectively control which components remain in the nanostructures.本研究聚焦于基于衬底的纳米加工技术的发展，此类技术具备鲁棒性与可扩展性，且可制备出现有工艺难以获得的纳米结构。本次报道的纳米加工技术可单独或组合依托以下四类手段：(i) 金纳米粒子阵列，作为制备更复杂纳米结构的模板；(ii) 生长塑形配体，用于限定液相合成后纳米结构的几何形貌；(iii) 原子层沉积（Atomic Layer Deposition），实现金属氧化物的均匀原子级超薄沉积；(iv) 刻蚀工艺（含湿法刻蚀与干法刻蚀），用于选择性调控纳米结构中留存的组分。