Depth profile of the gold-silver bimetallic structures
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Silver and gold bimetallic layers were deposited on a silicon substrate by magnetron sputtering method. Both, Au and Ag layers had 3 nm of thickness. That prepared nanostructures were measured by XPS method. To obtain a depth profile of chemical composition, an Argon ion (Ar+) gun was used for etching surface of sample. Each cycle of etching takes 30 sec. It was repeated 7 times. As a result of etching, and simultaneous XPS measurements a profile of concentration. For measurements XPS UHV system, Omicron Nanotechnology, equpied with Ar ion gun was used.
提供机构：
Marcin Stanisław Łapiński
