Dataset for Enhanced photoluminescence of plasma treated recycled glass particles

Figure 2. The normalized FTIR absorbance spectra measured in FTIR spectrometer with ATR accessory after low pressure plasma treatment at room temperature (a) and at 500°C (b).Figure 3. IR Raman spectra measured in FTIR spectrometer with 1064 nm laser excitation after low pressure plasma treatment at room temperature (a) and at 500°C (b). Figure 4. C 1s (a), and O 1s (b) XPS spectra (from top to bottom) for the “As received” sample, the samples treated in H2, O2, and N2 plasma at room temperature, annealed in H2, O2, and N2 atmosphere at 500°C, and annealed in H2, O2, and N2 plasma at 500°C. Dots represent measured data, black lines results of fits, colored lines fitting components. Peaks shaded by grey originate from carbon-oxygen contamination.\n\nFigure 5. Ratio of selected components derived from fitting XPS spectra. We use following labels for simplification: BO: Si-O-Si bridging oxygen, NBO: Si-O-M non-bridging oxygen, H2O: oxygen from hydrous species bound to silicon (H2O, Si-OH), CO: carbon-oxygen contaminations (C-O(H), C=O, COOH), C: atomic concentration of carbon normalized to 1. The absolute uncertainty was esti-mated to be of ± 0.2 and not included in the graph for better clarity. It should be noted that a sub-stantial portion of the uncertainty is given by a systematic approach of data analysis (same in all cases) resulting in high reliability of data trends. Figure 6. PL spectra of treated glass powder oxygen plasma. “RT plasma”, resp. “500°C plasma” represents the PL spectra measured after room temperature, resp. 500°C O2 plasma treatment, The PL spectra of as received and annealed at 500°C in O2 atmosphere (no plasma) glass powder were added for comparison. Figure 7. PL spectra of room temperature H2 plasma treated glass powder using sinusoidal UV LED excitation at frequency of 100 kHz (a). The curve with error bars corresponds to the spectrally re-solved mean PL decay time τ calculated from the phase shift between the excitation and the emis-sion spectra. The time resolved PL emission measured by TCSPC at 450 nm is shown in (b). The instrumental response function measured at the excitation pulse wavelength (excitation pulse shape) and fitted curve were added for comparison. All measurements were done at RT.

图2 为室温及500℃低压等离子体处理后，采用配备衰减全反射（ATR, Attenuated Total Reflection）附件的傅里叶变换红外（FTIR, Fourier Transform Infrared）光谱仪测得的归一化FTIR吸收光谱，其中(a)对应室温处理样品，(b)对应500℃处理样品。
图3 为室温及500℃低压等离子体处理后，采用配备1064 nm激光激发模块的FTIR光谱仪测得的红外拉曼光谱，其中(a)对应室温处理样品，(b)对应500℃处理样品。
图4 为C 1s(a)与O 1s(b)的X射线光电子能谱（XPS, X-ray Photoelectron Spectroscopy），样品按从上至下依次为：原始态"As received"样品、室温下经H₂、O₂及N₂等离子体处理的样品、500℃下于H₂、O₂及N₂气氛中退火的样品，以及500℃下于H₂、O₂及N₂等离子体中退火的样品。图中圆点为实测数据，黑线为拟合结果，彩色线为拟合组分。灰色阴影标记的峰源自碳氧污染。
图5 为通过XPS光谱拟合得到的指定组分占比。为简化表述，采用以下标记：BO：Si-O-Si桥氧；NBO：Si-O-M非桥氧；H₂O：与硅结合的含水物种中的氧（H₂O、Si-OH）；CO：碳氧污染物（C-O(H)、C=O、COOH）；C：归一化至1的碳原子浓度。绝对不确定度经估算为±0.2，为保证图表清晰未在图中展示。需说明的是，不确定度的主要来源为统一的系统性数据分析方法（所有样品均采用该方法），因此数据趋势具备较高可靠性。
图6 为经O₂等离子体处理的玻璃粉末的光致发光（PL, Photoluminescence）光谱。其中“RT plasma”与“500℃ plasma”分别对应室温O₂等离子体处理及500℃ O₂等离子体处理后的PL光谱；为便于对比，同时给出了原始态玻璃粉末以及500℃下于O₂气氛中退火（未经过等离子体处理）的玻璃粉末的PL光谱。
图7 为采用频率100 kHz的正弦紫外LED激发时，经室温H₂等离子体处理的玻璃粉末的PL光谱(a)。带误差棒的曲线为通过激发光谱与发射光谱之间的相移计算得到的光谱分辨平均PL衰减时间τ。通过时间相关单光子计数（TCSPC, Time-Correlated Single Photon Counting）在450 nm处测得的时间分辨PL发射光谱如(b)所示。为便于对比，同时给出了在激发脉冲波长处测得的仪器响应函数（激发脉冲形状）以及拟合曲线。所有测量均在室温下完成。