A new look at the Germanium electrochemistry

The aim of this proposal is to investigate the electrochemical behaviour of Ge in aqueous solution. Several aspects of the Germanium electrochemistry are still poorly understood, the most peculiar aspect maybe the Ge electrodeposition process: even at potentials well below the Nernst potential the deposition of Ge seems to be limited to the equivalent of 2.5 Monolayers independently on material and substrate. In the literature this is explained with the presence of a surface-limited electrodeposition phenomenon known as Under Potential Deposition (UPD). Although this explanation might support the observation of a self limiting growth process it seems to contradict the fact that the limited same behaviour is observed independently of the substrate composition. This experiment intends to provide a physical explanation for this behaviour.

本研究旨在探究锗（Germanium）在水溶液中的电化学行为。目前人们对锗电化学的诸多方面仍知之甚少，其中最特殊的当属锗电沉积过程：即使在远低于能斯特电位（Nernst potential）的电势下，锗的沉积量似乎仅能达到相当于2.5个单原子层（Monolayers）的水平，且与沉积材料和基底无关。现有文献将该现象归因于一种受表面限制的电沉积现象，即欠电位沉积（Under Potential Deposition，UPD）。尽管该解释能够支撑自限制生长过程的观测结果，但它似乎与另一事实相悖：无论基底成分如何，均会观测到相同的受限沉积行为。本实验旨在为该现象提供物理解释。