Silicon and Dielectric Dry-Etch Recipes

This work contains a series of SEM images and descriptions describing various etches used commonly for dielectrics (SiNx, SiO2) and Si. Some are failures, some are successes. Each was taken on the S4800 Hitachi SEM in the Micro and Nano Technology Lab at the University of Illinois at Urbana-Champaign during the RET taking place the summer of 2016.

本数据集包含一系列扫描电子显微镜（Scanning Electron Microscope, SEM）图像及配套说明，涵盖常用于电介质（氮化硅SiNx、二氧化硅SiO2）与单晶硅（Si）的各类蚀刻工艺，其中部分蚀刻结果为失效案例，部分为成功案例。本系列所有图像均拍摄于2016年夏季RET项目期间，拍摄设备为伊利诺伊大学厄巴纳-香槟分校微纳技术实验室的日立S4800型扫描电子显微镜。