基于步进拼接的大尺寸超表面压印模版制备实验数据集

本数据集针对大尺寸超表面在规模化应用中面临的高精度、大幅面压印模版制备难题，开展了基于步进拼接技术的工艺研究。实验数据采集于2023年至2025年。通过电子束曝光、磁控溅射及步进拼接闪光纳米压印等关键技术，构建了涵盖高精度母版制备、高性能薄膜沉积与大幅面模版验证的完整实验数据集。数据集详细记录了曝光模式、剂量、速率等参数对模版精度、速度的影响；磁控溅射功率、偏压、气压等工艺变量对薄膜光学性能的影响；拼接误差、残胶厚度等对模版质量的影响分析，以及所制备样品的幅面尺寸、单元结构尺寸和压印精度等核心性能指标的测量与评估结果。数据处理采用了多次测量取平均值、计算标准偏差及标准误差等统计方法，薄膜光学常数由椭偏仪采集分析。在质量控制方面，所有关键设备（如电子束曝光系统、扫描电镜、椭偏仪、游标卡尺）在使用前均经过严格校准；部分数据由具备CMA/CNAS资质的第三方检测机构依据专家论证的测试方法独立验证，确保了数据的可靠性。本数据集为解决大尺寸超表面模版制备中的效率与精度瓶颈提供了扎实、可信的实验数据基础。对微纳制造、集成光学及先进功能材料等领域的研发与工艺优化具有重要的学术价值与工程应用前景。数据容量39.4 MB。

This dataset conducts process research based on step-and-repeat stitching technology to address the challenges of high-precision, large-area imprint template fabrication for large-size metasurfaces in large-scale applications. The experimental data were collected between 2023 and 2025. Through key technologies including electron beam lithography (EBL), magnetron sputtering, and step-and-repeat flash nanoimprint lithography, a complete experimental dataset covering high-precision master fabrication, high-performance thin film deposition, and large-area template validation has been constructed. The dataset comprehensively records the impacts of process parameters such as exposure mode, dose, and rate on template accuracy and speed; the effects of magnetron sputtering variables including power, bias voltage, and gas pressure on the optical properties of thin films; the analysis of how stitching errors, residual film thickness, and other factors affect template quality; as well as the measurement and evaluation results of core performance indicators such as the sample size, unit structure size, and imprint accuracy of the prepared samples. Statistical methods including multiple measurement averaging, standard deviation calculation, and standard error calculation were employed for data processing, and the optical constants of thin films were collected and analyzed using an ellipsometer. For quality control, all key equipment (such as electron beam lithography systems, scanning electron microscopes (SEM), ellipsometers, and vernier calipers) underwent strict calibration prior to use; part of the data was independently verified by third-party testing institutions with CMA/CNAS qualifications according to expert-validated test methods, ensuring the reliability of the dataset. This dataset provides a solid and credible experimental data foundation for resolving the efficiency and accuracy bottlenecks in the fabrication of large-size metasurface templates, and holds significant academic value and engineering application prospects for R&D and process optimization in fields such as micro-nano manufacturing, integrated optics, and advanced functional materials. The data volume of this dataset is 39.4 MB.

搜集汇总

背景与挑战

背景概述

该数据集针对大尺寸超表面压印模版制备中的高精度与大幅面挑战，基于步进拼接技术开展工艺研究，提供了涵盖电子束曝光、磁控溅射等关键工艺的实验数据。它详细记录了工艺参数对模版性能的影响，并经过严格质量控制，为相关领域的研发与优化提供了可靠数据基础。