This is an open source dataset of optical emission spectra and optical images in fluorocarbon plasmas, along with associated tool logs, captured from a Oxford Intruments Plasma Technology PP100 ICP et
In this study, experiments were conducted to etch SiO₂ and Si₃N₄ by introducing N₂ at flow rates of 0, 2, 4, 6, and 8 sccm into a CF₄/O₂ plasma. OES (Optical Emission Spectroscopy) data were systemati
The SiO2 etching process using CF4/O2 plasma is a critical step in semiconductor manufacturing, where process efficiency and precise control are essential. In this study, optical emission spectroscopy
