Initial oxidation mechanism of FeCrAl thin films with Nb and Si additions

FeCrAl thin films are considered optimal candidates for protecting surfaces in harsh environments, with potential for improvement in their anti-oxidation properties by incorporating beneficial dopants such as Nb and Si. However, the thermodynamic mechanism responsible for this improvement remains unknown. This contributes to improvements in the thin films' anti-oxidation properties. Overall, this research sheds light on the origin of the improved oxidation resistance of FeCrAl thin films containing Nb and Si.