Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
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Source data for Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
创建时间：
2023-07-27
