Polymer sequence alters sensitivity and resolution in chemically amplified polypeptoid photoresists

This dataset accompanies the article \"Polymer sequence alters sensitivity and resolution in chemically amplified polypeptoid photoresists\" by Cameron P. Adams, Carolyn Henein, Xiangxi Meng, Javier Read de Alaniz, Christopher K. Ober, and Rachel A. Segalman. The abstract for the full manuscript is: Continuous progress in semiconductor technology relies on the ability to pattern transistors at sub-10 nm dimensions, necessitating the development of high-resolution photoresists for extreme ultraviolet (EUV) lithography. Chemically amplified resists, traditionally composed of multicomponent polymer systems, face increasing challenges at such patterning wavelengths due to nanoscale heterogeneity and stochastic defects. To address these limitations, this study explores polypeptoids—monodisperse, sequence-defined polymers—as a new class of photoresists with precise molecular control. Systematic variation of polypeptoid chain length reveals a critical threshold necessary for successful pattern f..., , This README.txt file was generated on 2025-06-30 by CAMERON ADAMS GENERAL INFORMATION 1. Title of Dataset: Polymer sequence alters sensitivity and resolution in chemically amplified polypeptoid photoresists. 2. Author Information A. Principal Investigator Contact Information Name: Rachel A. Segalman Institution: University of California, Santa Barbara Address: Materials Research Laboratory, University of California, Santa Barbara, California 93106 Email: [[e-mail]](mailto:[e-mail]) B. Principal Investigator Contact Information Name: Christopher K. Ober Institution: Cornell University Address: Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 Email: [[e-mail]](mailto:[e-mail]) C. Principal Investigator Contact Information Name: Javier Read de Alaniz Institution: University of California, Santa Barbara Address: Department of Chemistry & Biochemistry, University of Cali...,