Dataset for "Displacement Talbot Lithography: an alternative technique to fabricate nanostructured metamaterials"

This dataset contains scanning electron microscopy (SEM) secondary electron (SE) images of linear gratings resist, dashes and holes in resist that were obtained using Displacement Talbot lithography. These techniques were used to assess the dimensions of the resist features that were obtained with linear grating mask, using single or double exposure steps. SE images also shows the lift-off profile used in order to obtain metamaterial 'fishnet' like metallic structures. The dimensions of the measured linear gratings, dashes and holes are written in text files.本数据集包含采用位移塔尔博特光刻制备的线性光栅光刻胶、光刻胶内短线段与孔洞的扫描电子显微镜（Scanning Electron Microscopy，SEM）二次电子（Secondary Electron，SE）图像。上述成像技术可用于评估采用单次或两次曝光工艺、通过线性光栅掩模制备的光刻胶结构尺寸。二次电子图像同时展示了用于制备类超材料“渔网”式金属结构的剥离工艺形貌。待测线性光栅、短线段与孔洞的尺寸数据均存储于文本文件中。