Dataset for "Understanding the resolution limit of Displacement Talbot Lithography"
收藏官方服务：
资源简介：
Full details may be found in the associated paper.
应用场景：
创建时间：
2023-06-28
相关数据集
Dataset of latest developments in EUV photoresist evaluation capability at SSRF
The 08U1B beamline at SSRF provides the experimental platform for EUV photoresist evaluation,The performance of the transmission grating mask and the vibration control in the interference lithography
DataCite Commons2025-04-27 更新800
Lithography stitching error analysis and compensation
The data set is the experimental data of the paper ' Alignment Accuracy Improvement in Laser Heat-mode Scanning Lithography System through Dual-galvanometer Coordinate Compensation ', including measur
DataCite Commons2025-04-27 更新120
Supplementary Data for: Optimization of grayscale lithography for the fabrication of Flat Diffractive Infrared Lenses on Silicon Wafers
DATASET MIGRATED FROM FIGSHARE: Images and data acquired during the experiment and presented in the article.
DataONE2025-12-19 更新80
Data for: "Automated Alignment in Mask-Free Photolithography Enabled by Micro-LED Arrays"
This data is a series of images that have been taken via a CCD camera in the process of automated alignment. There are four folders in this data, each containing a series of .jpg images, taken to work
Mendeley Data2024-03-27 更新170
Angle Monitor of Micromirror Array for Freeform Illumination in Lithography Systems
In this paper, we propose an angle monitor to ensure the high-precision tilting of thousands of biaxialmicromirrors. As one of the critical modules for closed-loop control of the two-dimensional micro
DataCite Commons2025-04-27 更新100
