Influence of electron beam exposure dose on the properties of NbN superconducting nanowires
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Figure 1 is a schematic diagram of the process flow made in the PPT, Data of Figure 2 is table data, Figure 3 is SEM image, Data of Figure 4 is resistance data measured using a comprehensive physical property measurement system (PPMS) and parameters analyzed based on these data, Figure 5 is EPS image of extremely low temperature Rs-T and I-V data measured using PPMS, and Data of Figure 6 is resistance data measured using PPMS.
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中国科学院上海微系统与信息技术研究所创建时间:
2025-11-27



