硅基微纳锗硅探测器阵列制备工艺数据

本数据集主要面向硅基光电探测器阵列制备工艺研究，主要包括硅基锗探测器外延后、制备完成后的显微镜照片和硅基锗探测器与硅基波分复用AWG结构的片上集成照片，以及硅基微纳锗硅探测器的全部制备工艺过程示意图、器件的显微镜照片和截面结构图。This dataset is primarily targeted at research on the fabrication process of silicon-based photodetector arrays. It mainly includes micrographs of silicon-germanium (SiGe) photodetectors at both post-epitaxial and post-fabrication stages, on-chip integration micrographs of SiGe photodetectors integrated with silicon-based wavelength division multiplexing (WDM) arrayed waveguide grating (AWG) structures, as well as schematic diagrams of the entire fabrication process, micrographs of the devices, and cross-sectional structure images of silicon-based micro-nano SiGe photodetectors.

搜集汇总

背景与挑战

背景概述

该数据集聚焦于硅基光电探测器阵列的制备工艺研究，提供了硅基锗探测器外延后和制备完成后的显微镜照片、与硅基波分复用AWG结构的片上集成照片，以及完整的制备工艺示意图、器件显微镜照片和截面结构图。数据以PDF、JPG和PNG格式存储，包含6个文件，总大小为0.32MB，来源于实验试验。